top of page

32. Highly tolerant a-Si distributed Bragg reflector fabricated by oblique angle deposition

S. J. Jang, Y. M. Song, C. I. Yeo, C. Y. Park, and Y. T. Lee*

Opt. Mater. Express 1, 451 (2011).

School of Electrical Engineering and Computer Science, Gwangju Institute of Science Technology,

123, Cheomdangwagi-ro, Buk-gu, Gwangju 61005, Korea

Tel : +82-62-715-2655 Fax : +82-62-715-2657

© 2017 by FOEL. Proudly created by YJs. All Rights reserved.  

Lecture

Members only

bottom of page